Three-dimensional nanofabrication using HSQ/PMMA bilayer resists

Three-dimensional nanofabrication using HSQ/PMMA bilayer resists

In this work, the authors developed two processes for fabricating three-dimensional (3D) nanostructures using a hydrogen silsesquioxane and poly(methylmethacrylate) bilayer resist stack. The resist stack was patterned in a single electron-beam writing step without removing the wafer. The resulting 3...

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Bibliographic Details
Main Authors: Do, Hyung Wan (Contributor), Chang, Jae-Byum (Contributor), Berggren, Karl K (Author)
Other Authors: Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science (Contributor), Massachusetts Institute of Technology. Department of Materials Science and Engineering (Contributor), Program in Media Arts and Sciences (Massachusetts Institute of Technology) (Contributor), Berggren, Karl K. (Contributor)
Format: Article
Language:English
Published: American Vacuum Society (AVS), 2015-11-09T14:24:48Z.
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