Fabrication and Characterization of Polycrystalline Silicon Thin-Film Transistors
博士 === 國立交通大學 === 電子工程學系 === 85 === In this thesis, we firstly discuss the dosage effect on dopant activation in polysilicon films. The arsenic (for n-type) and boron (for p-type) were implanted into low-pressure chemical vapor deposited (LPCVD) amorphous...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
1997
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| Online Access: | http://ndltd.ncl.edu.tw/handle/83160003174491913161 |