Advanced photomask characterisation for microlithography
This thesis addresses the characterisation of these advanced photomasks. There are many techniques published that produce advanced masks, but this work deals with two of the primary ones, advanced binary masks and alternating phase shift masks (altPSM). The work covered studies the methods of extrac...
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University of Edinburgh
2006
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| Online Access: | http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.666100 |