High-Precision Regulation of Nano-Grating Linewidth Based on ALD

High-Precision Regulation of Nano-Grating Linewidth Based on ALD

A nano-grating standard with accurate linewidth can not only calibrate the magnification of nano-measurement instruments, but can also enable comparison of linewidths. Unfortunately, it is still a challenging task to control the linewidth of nano-grating standards. Accordingly, in this paper, atomic...

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Bibliographic Details
Main Authors: Jiang, Z. (Author), Jing, W. (Author), Lin, Q. (Author), Wang, C. (Author), Wang, S. (Author), Wang, Y. (Author), Zhang, L. (Author), Zhang, Y. (Author), Zhao, Y. (Author), Zhu, N. (Author)
Format: Article
Language:English
Published: MDPI 2022
Subjects:
Atomic layer deposition
atomic layer deposition (ALD)
Atomic-layer deposition
Calibration
Electron beam lithography
High-precision
Linewidth
linewidth regulation
Linewidth regulation
Measurements instruments
micro-and nano-metrology
Micro-and nano-metrology
Nanograting
Nanometrology
One-dimensional
one-dimensional nano-grating standard
One-dimensional nano-grating standard
Optoelectronic devices
Periodic structures
Tuning
Uncertainty analysis
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