Investigation of mechanical morphological structural and electrochemical properties of PVD TiAlN coating: A detail experimental and its correlation with an analytical approach using the least square method

In this experimental investigation, a Physical Vapor Deposition (PVD) process was employed to deposit TiAlN coating onto a Si substrate. The nitrogen flow rate, bias voltage, and substrate-to-target distance were selected as input parameters, each with three different levels. The design of these inp...

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書目詳細資料
發表在:Applied Surface Science Advances
Main Authors: Soham Das, Soumya Kanti Biswas, Abhishek Kundu, Ranjan Ghadai, Spandan Guha
格式: Article
語言:英语
出版: Elsevier 2024-12-01
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在線閱讀:http://www.sciencedirect.com/science/article/pii/S2666523924000667