The use of one-component plasma in the icp-rie etching process of periodic structures for applications in photodetector arrays

The paper presents the effect of ICP-RIE etching time using one-component plasma on various parameters of an InAs/GaSb type II superlattice matrix. In the studies, two samples used at different BCl3 gas flow rates were compared and it was found that using a lower flow rate of 7 sccm results in obtai...

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Bibliographic Details

Published in:	Metrology and Measurement Systems
Main Authors:	Marta Różycka, Agata Jasik, Paweł Kozłowski, Krzysztof Bracha, Jacek Ratajczak, Anna Wierzbicka-Miernik
Format:	Article
Language:	English
Published:	Polish Academy of Sciences 2023-11-01
Subjects:	icp-rie dry etching type ii inas/gasb superlattice bcl3
Online Access:	https://journals.pan.pl/Content/130315/art13_int.pdf