Application Properties of ZnO and AZO Thin Films Obtained by the ALD Method

The thin layers of ZnO and ZnO: Al (Al doped zinc oxide—AZO) were deposited by the atomic deposition layer (ALD) method on silicon and glass substrates. The structures were deposited using diethylzinc (DEZ) and deionized water as zinc and oxygen precursors. A precursor of trimethylaluminum (TMA) was...

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發表在:	Energies
Main Authors:	Barbara Swatowska, Wiesław Powroźnik, Halina Czternastek, Gabriela Lewińska, Tomasz Stapiński, Rafał Pietruszka, Bartłomiej S. Witkowski, Marek Godlewski
格式:	Article
語言:	英语
出版:	MDPI AG 2021-10-01
主題:	AZO thin films ALD technique optical properties structural properties electrical parameters
在線閱讀:	https://www.mdpi.com/1996-1073/14/19/6271