Influence of the Incorporation of Nd in ZnO Films Grown by the HFCVD Technique to Enhance Photoluminiscence Due to Defects

In this work, optical–structural and morphological behavior when Nd is incorporated into ZnO is studied. ZnO and Nd-doped ZnO (ZnO-Nd) films were deposited at 900 °C on Silicon n-type substrates (100) by using the Hot Filament Chemical Vapor Deposition (HFCVD) technique. For this, pellets were made...

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Bibliographic Details

Published in:	Crystals
Main Authors:	Marcos Palacios Bonilla, Godofredo García Salgado, Antonio Coyopol Solís, Román Romano Trujillo, Fabiola Gabriela Nieto Caballero, Enrique Rosendo Andrés, Crisóforo Morales Ruiz, Justo Miguel Gracia Jiménez, Reina Galeazzi Isasmendi
Format:	Article
Language:	English
Published:	MDPI AG 2024-05-01
Subjects:	HFCVD silicon ZnO-Nd sea urchin
Online Access:	https://www.mdpi.com/2073-4352/14/6/491