CONSIDERATIONS REGARDING THE USE OF SU-8 PHOTORESIST IN MEMS TECHNIQUE

Microelectromechanical systems (MEMS) represent the technology of microscopic devices. In this domain, photolithography is the most common method in order to obtain MEMS structures. The photoresist is the key element for microelectronic and MEMS technology. SU-8 is one kind of negative photoresist,...

وصف كامل

التفاصيل البيبلوغرافية
الحاوية / القاعدة:Nonconventional Technologies Review
المؤلفون الرئيسيون: Maria Roxana Marinescu, Marioara Avram, Catalin Parvulescu, Corneliu Voitincu, Vasilica Tucureanu, Alina Matei
التنسيق: مقال
اللغة:الإنجليزية
منشور في: Editura Politehnica, Timisoara 2018-09-01
الموضوعات:
Photolithography
photoresist
SU-8
micro-electro-mechanical systems (MEMS)
microfluidics
الوصول للمادة أونلاين:http://www.revtn.ro/index.php/revtn/article/view/34

الانترنت

http://www.revtn.ro/index.php/revtn/article/view/34

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