Challenges in modulation doping of n-type Ge/SiGe heterostructures: The role of epitaxial and thermal strain
N-type Ge-rich Ge/SiGe multi-quantum-wells on Si(001) substrates are a novel material system with great potential due to their compatibility with the CMOS standard. This class of strained quantum heterostructures exhibits different band edge minima in a narrow energy range. Thus, lattice deformation...
| Published in: | APL Materials |
|---|---|
| Main Authors: | , , , , , , , , , , |
| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2025-06-01
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| Online Access: | http://dx.doi.org/10.1063/5.0259848 |
