Elevating Wafer Defect Inspection with Denoising Diffusion Probabilistic Model

Integrated circuits (ICs) are critical components in the semiconductor industry, and precise wafer defect inspection is essential for maintaining product quality and yield. This study addresses the challenge of insufficient sample patterns in wafer defect datasets by using the denoising diffusion pr...

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Bibliographic Details

Published in:	Mathematics
Main Authors:	Ping-Hung Wu, Thi Phuong Hoang, Yen-Ting Chou, Andres Philip Mayol, Yu-Wei Lai, Chih-Hsiang Kang, Yu-Cheng Chan, Siou-Zih Lin, Ssu-Han Chen
Format:	Article
Language:	English
Published:	MDPI AG 2024-10-01
Subjects:	wafer defect inspection generative model denoising diffusion probabilistic model You Only Look Once Version 8
Online Access:	https://www.mdpi.com/2227-7390/12/20/3164