Mapping Oxidation and Wafer Cleaning to Device Characteristics Using Physics-Assisted Machine Learning

書目詳細資料
發表在:ACS Omega
Main Authors: Sparsh Pratik, Po-Ning Liu, Jun Ota, Yen-Liang Tu, Guan-Wen Lai, Ya-Wen Ho, Zheng-Kai Yang, Tejender Singh Rawat, Albert S. Lin
格式: Article
語言:英语
出版: American Chemical Society 2022-01-01
在線閱讀:https://doi.org/10.1021/acsomega.1c05552