Effect of Warm Crossing Rolling on the Microstructure, Texture and Annealing Behavior of High-Purity Tantalum

With advanced integrated circuit semiconductor chips, the uniformity of microstructure and texture is increasingly required for tantalum (Ta) targets. A combination of warm rolling and 135° cross rolling (CR) at the temperature of 500 °C and 800 °C, i.e., warm cross rolling (WCR), was carried out in...

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Bibliographic Details

Published in:	Metals
Main Authors:	Yuping Ding, Song Wang, Min Zhang, Shiyuan Zhou, Shifeng Liu, Xiaoli Yuan
Format:	Article
Language:	English
Published:	MDPI AG 2023-04-01
Subjects:	microstructure texture warm cross rolling annealing tantalum
Online Access:	https://www.mdpi.com/2075-4701/13/5/838