Investigation of Compact Hollow-Anode Discharge Source for Copper Thin Films by Sputtering Processes
A compact hollow-anode discharge (HAD) source with a size of 60 mm in radius and 70 mm in length has been developed to stably generate plasma jets for various sputtering processes in semiconductor and display fabrications. A developed HAD plasma source has been investigated by cylindrical electric p...
| 出版年: | Energies |
|---|---|
| 主要な著者: | , , , |
| フォーマット: | 論文 |
| 言語: | 英語 |
| 出版事項: |
MDPI AG
2021-05-01
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| 主題: | |
| オンライン･アクセス: | https://www.mdpi.com/1996-1073/14/11/3138 |