The Characteristics of Seebeck Coefficient in Silicon Nanowires Manufactured by CMOS Compatible Process
<p>Abstract</p> <p>Silicon nanowires are patterned down to 30 nm using complementary metal-oxide-semiconductor (CMOS) compatible process. The electrical conductivities of n-/p-leg nanowires are extracted with the variation of width. Using this structure, Seebeck coefficients are me...
| Published in: | Nanoscale Research Letters |
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| Main Authors: | , , , , , |
| Format: | Article |
| Language: | English |
| Published: |
SpringerOpen
2010-01-01
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| Subjects: | |
| Online Access: | http://dx.doi.org/10.1007/s11671-010-9690-2 |
