The adsorptive-kinetic model of in-situ phosphorus doped film polysilicon deposition process
The investigation of deposition kinetics of in-situ phosphorus doped polysilicon films has been performed. The adsorptive-kinetic model of in-situ phosphorus doped polysilicon deposition has been developed. The values of heterogeneous reaction constants and constants, which describe the desorption p...
| Published in: | Tekhnologiya i Konstruirovanie v Elektronnoi Apparature |
|---|---|
| Main Authors: | , |
| Format: | Article |
| Language: | English |
| Published: |
Politehperiodika
2009-11-01
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| Subjects: | |
| Online Access: | http://www.tkea.com.ua/tkea/2009/6_2009/pdf/11.zip |