AFM-IR investigation of thin PECVD SiOx films on a polypropylene substrate in the surface-sensitive mode

Thin silicon oxide films deposited on a polypropylene substrate by plasma-enhanced chemical vapor deposition were investigated using atomic force microscopy-based infrared (AFM-IR) nanospectroscopy in contact and surface-sensitive mode. The focus of this work is the comparison of the different measu...

Full description

Bibliographic Details

Published in:	Beilstein Journal of Nanotechnology
Main Authors:	Hendrik Müller, Hartmut Stadler, Teresa de los Arcos, Adrian Keller, Guido Grundmeier
Format:	Article
Language:	English
Published:	Beilstein-Institut 2024-05-01
Subjects:	afm-ir polypropylene surface-sensitive mode silicon oxide thin films xps
Online Access:	https://doi.org/10.3762/bjnano.15.51