Study of Self Heating Effect in the wake of complete and partial bottom dielectric insertion under 5 nm Stacked Nanosheet Transistor
Beyond 7 nm technology nodes, a Stacked Nanosheet Field Effect Transistor (SNT) is a potential candidate to continue device scaling due to its higher ON/OFF current ratio and less Short Channel Effect than FinFET. However, its gate all-around structure with low thermal conductive HiK oxide material...
| Published in: | Memories - Materials, Devices, Circuits and Systems |
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| Main Authors: | , , , |
| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2023-07-01
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| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2773064623000336 |
