Simulation of electron transfer processes in a semiconductor structure using graphene and boron nitride

This paper presents the results of simulating the electron transfer processes in a three-dimensional semiconductor structure containing graphene and layers of boron hexagonal nitride using the Monte – Carlo method. Graphene is currently considered one of the most promising materials for the creation...

وصف كامل

التفاصيل البيبلوغرافية
الحاوية / القاعدة:Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki
المؤلفون الرئيسيون: V. V. Muravyov, V. N. Mishchenka
التنسيق: مقال
اللغة:الروسية
منشور في: Educational institution «Belarusian State University of Informatics and Radioelectronics» 2020-11-01
الموضوعات:
الوصول للمادة أونلاين:https://doklady.bsuir.by/jour/article/view/2902