Photo‐Thermal Approaches on Polyimide Film for Demonstration of Sub‐50 µm Polymer Stencil Mask
Abstract Stencil masks are widely utilized in traditional macro‐scale patterning due to their simplicity and versatility in enabling various types of patterns. Compared to photoresist‐based methods, stencil‐based patterning enables chemical‐free processing and curved surface application. However, th...
| الحاوية / القاعدة: | Advanced Electronic Materials |
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| المؤلفون الرئيسيون: | , , , , , , |
| التنسيق: | مقال |
| اللغة: | الإنجليزية |
| منشور في: |
Wiley-VCH
2025-07-01
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| الموضوعات: | |
| الوصول للمادة أونلاين: | https://doi.org/10.1002/aelm.202400979 |
