Influence of heavier impurity deposition on surface morphology development and sputtering behavior explored in multiple linear plasma devices

Surface morphology development and sputtering behavior of Cr, as a test material, have been explored under He plasma exposure at a low incident ion energy of ∼80 eV in multiple linear plasma devices: PISCES-A, PSI-2, and NAGDIS-II. From comparison of the experiments in these devices, deposition of a...

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Bibliographic Details

Published in:	Nuclear Materials and Energy
Main Authors:	D. Nishijima, A. Kreter, M.J. Baldwin, D. Borodin, A. Eksaeva, D. Hwangbo, S. Kajita, M. Miyamoto, N. Ohno, M. Patino, A. Pospieszczyk, M. Rasinski, T. Schlummer, A. Terra, R.P. Doerner
Format:	Article
Language:	English
Published:	Elsevier 2019-01-01
Online Access:	http://www.sciencedirect.com/science/article/pii/S2352179118300619