Use of Nanosecond Laser Annealing for Thermally Stable Ni(GeSn) Alloys

In this study, we have conclusively used UV-nanosecond laser annealing (UV-NLA) as an alternative to classical rapid thermal annealing (RTA) for the formation of stable Ni-GeSn alloys. The phase formation sequence was similar to the one obtained with RTA. At low laser energy densities (ED) and after...

وصف كامل

التفاصيل البيبلوغرافية
الحاوية / القاعدة:IEEE Journal of the Electron Devices Society
المؤلفون الرئيسيون: Andrea Quintero, Pablo Acosta Alba, Jean-Michel Hartmann, David Cooper, Patrice Gergaud, Vincent Reboud, Philippe Rodriguez
التنسيق: مقال
اللغة:الإنجليزية
منشور في: IEEE 2023-01-01
الموضوعات:
GeSn
NiGeSn
laser annealing
contact
الوصول للمادة أونلاين:https://ieeexplore.ieee.org/document/10314999/

الانترنت

https://ieeexplore.ieee.org/document/10314999/

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