Compact GaN HEMT Power Amplifier MMIC Delivering Over 40 W for Ku-Band Applications

This paper presents the design and implementation of a high-power amplifier (HPA) using a 250-nm gallium nitride (GaN) high electron mobility transistor (HEMT) process on a silicon carbide substrate. The HPA is engineered to optimize both output power and power density relative to chip size. The 1st...

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書目詳細資料
發表在:IEEE Access
Main Authors: Yeongmin Jang, Wonseok Choe, Minchul Kim, Youngwan Lee, Jinho Jeong
格式: Article
語言:英语
出版: IEEE 2024-01-01
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在線閱讀:https://ieeexplore.ieee.org/document/10771749/