Application of Computational Fluid Dynamics in Chemical Vapor Deposition Simulation

Chemical vapor deposition (CVD) technique is widely used in industrial production, but the products of CVD technique are influenced by many parameters. To determine how the changes of the parameters influence the deposition quality, repeated experiments are needed to be carried out. By introducing c...

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發表在:	Cailiao Baohu
主要作者:	ZHANG Bowen, WU Yong, YANG Fu, XIA Siyao, HUANG Tianzong, MENG Shixu
格式:	Article
語言:	中文
出版:	Editorial Department of Materials Protection 2022-09-01
主題:	cvd|computational fluid dynamics|simulation method|application of cfd
在線閱讀:	http://www.mat-pro.com/fileup/1001-1560/PDF/20220922.pdf