Post Thermal Oxidation of Tin Thin Film on Silicon Substrate for MIS Hetrojunction Prepared by Thermal Evaporation

In this work, preparation of high quality conductive oxide SnO2 thin film by post-thermal trearment of deposited tin by vacuum thermal evaporation on glass and p -type silicon substratesfor preparation of metal-insulator-semiconductor hetrojunction. The opticalabsorption, electrical, structural and...

詳細記述

書誌詳細
出版年:Engineering and Technology Journal
第一著者: Halah H. Rashed
フォーマット: 論文
言語:英語
出版事項: Unviversity of Technology- Iraq 2016-04-01
主題:
オンライン・アクセス:https://etj.uotechnology.edu.iq/article_116206_7a5ef31973dc87bb91730198fed0eabb.pdf