Erratum: “Effect of thermal annealing on Boron diffusion, micro-structural, electrical and magnetic properties of laser ablated CoFeB thin films” [AIP Advances 3, 072129 (2013)]
| Published in: | AIP Advances |
|---|---|
| Main Authors: | , , , , , , |
| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2013-08-01
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| Online Access: | http://link.aip.org/link/doi/10.1063/1.4820356 |