Contrast Experiments in Dielectrophoresis Polishing (DEPP)/Chemical Mechanical Polishing (CMP) of Sapphire Substrate

The broad applications of sapphire substrates in many fields warrants an urgent demand for a highly efficient and high precision polishing method for the sapphire substrates. The authors proposed a novel sapphire substrate polishing method that is based on the dielectrophoresis (DEP) effect. The pri...

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Bibliographic Details

Published in:	Applied Sciences
Main Authors:	Tianchen Zhao, Julong Yuan, Qianfa Deng, Kaiping Feng, Zhaozhong Zhou, Xu Wang
Format:	Article
Language:	English
Published:	MDPI AG 2019-09-01
Subjects:	dielectrophoresis (DEP) polishing sapphire substrate material removal rate surface roughness flatness
Online Access:	https://www.mdpi.com/2076-3417/9/18/3704