Semiconductor cleaning technology for next generation material systems

This paper gives a brief overview of the challenges wafer cleaning technology is facing in the light of advanced silicon technology moving in the direction of non-planar device structures and the need for modified cleans for semiconductors other than silicon. In the former case, the key issue is re...

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Bibliographic Details
Published in:Journal of Telecommunications and Information Technology
Main Author: Jerzy Ruzyllo
Format: Article
Language:English
Published: National Institute of Telecommunications 2023-06-01
Subjects:
Online Access:https://jtit.pl/jtit/article/view/807