Deposition kinetics of in-situ oxygen doped polysilicon film
The influence of deposition conditions on composition of in-situ oxygen doped polysilicon films has been investigated. A kinetic model of adsorption-deposition process using concentrated silane and nitrous oxide has been developed. The range of optimal ratios of silane and nitrous oxide flows and de...
| Published in: | Технологія та конструювання в електронній апаратурі |
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| Main Authors: | , |
| Format: | Article |
| Language: | English |
| Published: |
Politekhperiodika
2012-02-01
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| Subjects: | |
| Online Access: | https://tkea.com.ua/index.php/journal/article/view/460 |