Fabrication of SiO2-based microcantilevers by anisotropic chemical etching of (100) single crystal Si

The undercutting process of thermal SiO2 microcantilevers with different orientations on (100) Si wafer was studied. The silicon substrate was removed by anisotropic chemical etching with a 25 wt. % aqueous solution of TMAH or a 30 wt. % aqueous KOH solution at 80 °C. It was found that <110> o...

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書誌詳細

出版年:	Journal of the Serbian Chemical Society
主要な著者:	VESNA JOVIC, JELENA LAMOVEC, MIRJANA POPOVIC, ZARKO LAZIC
フォーマット:	論文
言語:	英語
出版事項:	Serbian Chemical Society 2007-11-01
主題:	anisotropic wet chemical etching TMAH KOH SiO2 microcantilever SiO2 microbridge (100) oriented Si substrate
オンライン･アクセス:	http://www.shd.org.yu/JSCS/Vol72/No11/JSCS_V72_No11-11.pdf