Xenon Plasma Focused Ion Beam Milling for Obtaining Soft X-ray Transparent Samples
We employ xenon (Xe) plasma focused ion beam (PFIB) milling to obtain soft X-ray transparent windows out of bulk samples. The use of a Xe PFIB allows for the milling of thin windows (several 100 nm thick) with areas of the order of 100 µm × 100 µm into bulk substrates. In addition, we present an app...
| الحاوية / القاعدة: | Crystals |
|---|---|
| المؤلفون الرئيسيون: | , , , , , , , , |
| التنسيق: | مقال |
| اللغة: | الإنجليزية |
| منشور في: |
MDPI AG
2021-05-01
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| الموضوعات: | |
| الوصول للمادة أونلاين: | https://www.mdpi.com/2073-4352/11/5/546 |
| _version_ | 1850328646858833920 |
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| author | Sina Mayr Simone Finizio Joakim Reuteler Stefan Stutz Carsten Dubs Markus Weigand Aleš Hrabec Jörg Raabe Sebastian Wintz |
| author_facet | Sina Mayr Simone Finizio Joakim Reuteler Stefan Stutz Carsten Dubs Markus Weigand Aleš Hrabec Jörg Raabe Sebastian Wintz |
| author_sort | Sina Mayr |
| collection | DOAJ |
| container_title | Crystals |
| description | We employ xenon (Xe) plasma focused ion beam (PFIB) milling to obtain soft X-ray transparent windows out of bulk samples. The use of a Xe PFIB allows for the milling of thin windows (several 100 nm thick) with areas of the order of 100 µm × 100 µm into bulk substrates. In addition, we present an approach to empirically determine the transmission level of such windows during fabrication by correlating their electron and soft X-ray transparencies. We perform scanning transmission X-ray microscopy (STXM) imaging on a sample obtained by Xe PFIB milling to demonstrate the conceptual feasibility of the technique. Our thinning approach provides a fast and simplified method for facilitating soft X-ray transmission measurements of epitaxial samples and it can be applied to a variety of different sample systems and substrates that are otherwise not accessible. |
| format | Article |
| id | doaj-art-a096c8a0d3ea4d3d9be662ff89519c1d |
| institution | Directory of Open Access Journals |
| issn | 2073-4352 |
| language | English |
| publishDate | 2021-05-01 |
| publisher | MDPI AG |
| record_format | Article |
| spelling | doaj-art-a096c8a0d3ea4d3d9be662ff89519c1d2025-08-19T23:19:11ZengMDPI AGCrystals2073-43522021-05-0111554610.3390/cryst11050546Xenon Plasma Focused Ion Beam Milling for Obtaining Soft X-ray Transparent SamplesSina Mayr0Simone Finizio1Joakim Reuteler2Stefan Stutz3Carsten Dubs4Markus Weigand5Aleš Hrabec6Jörg Raabe7Sebastian Wintz8Paul Scherrer Institut (PSI), 5232 Villigen, SwitzerlandPaul Scherrer Institut (PSI), 5232 Villigen, SwitzerlandScientific Center for Optical and Electron Microscopy, ETH Zurich, 8093 Zurich, SwitzerlandPaul Scherrer Institut (PSI), 5232 Villigen, SwitzerlandINNOVENT e.V. Technologieentwicklung Jena, 07745 Jena, GermanyHelmholtz-Zentrum Berlin, 14109 Berlin, GermanyPaul Scherrer Institut (PSI), 5232 Villigen, SwitzerlandPaul Scherrer Institut (PSI), 5232 Villigen, SwitzerlandPaul Scherrer Institut (PSI), 5232 Villigen, SwitzerlandWe employ xenon (Xe) plasma focused ion beam (PFIB) milling to obtain soft X-ray transparent windows out of bulk samples. The use of a Xe PFIB allows for the milling of thin windows (several 100 nm thick) with areas of the order of 100 µm × 100 µm into bulk substrates. In addition, we present an approach to empirically determine the transmission level of such windows during fabrication by correlating their electron and soft X-ray transparencies. We perform scanning transmission X-ray microscopy (STXM) imaging on a sample obtained by Xe PFIB milling to demonstrate the conceptual feasibility of the technique. Our thinning approach provides a fast and simplified method for facilitating soft X-ray transmission measurements of epitaxial samples and it can be applied to a variety of different sample systems and substrates that are otherwise not accessible.https://www.mdpi.com/2073-4352/11/5/546Xe plasma focused ion beamsoft X-ray transparencytransmission X-ray microscopy |
| spellingShingle | Sina Mayr Simone Finizio Joakim Reuteler Stefan Stutz Carsten Dubs Markus Weigand Aleš Hrabec Jörg Raabe Sebastian Wintz Xenon Plasma Focused Ion Beam Milling for Obtaining Soft X-ray Transparent Samples Xe plasma focused ion beam soft X-ray transparency transmission X-ray microscopy |
| title | Xenon Plasma Focused Ion Beam Milling for Obtaining Soft X-ray Transparent Samples |
| title_full | Xenon Plasma Focused Ion Beam Milling for Obtaining Soft X-ray Transparent Samples |
| title_fullStr | Xenon Plasma Focused Ion Beam Milling for Obtaining Soft X-ray Transparent Samples |
| title_full_unstemmed | Xenon Plasma Focused Ion Beam Milling for Obtaining Soft X-ray Transparent Samples |
| title_short | Xenon Plasma Focused Ion Beam Milling for Obtaining Soft X-ray Transparent Samples |
| title_sort | xenon plasma focused ion beam milling for obtaining soft x ray transparent samples |
| topic | Xe plasma focused ion beam soft X-ray transparency transmission X-ray microscopy |
| url | https://www.mdpi.com/2073-4352/11/5/546 |
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