In Situ Plasma‐Grown Silicon‐Oxide for Polysilicon Passivating Contacts
Abstract Large‐scale manufacturing of polysilicon‐based passivating contacts for high‐efficiency crystalline silicon (c‐Si) solar cells demands simple fabrication of thermally stable SiOx films with well controlled microstructure and nanoscale thickness to enable quantum‐mechanical tunneling. Here,...
| Published in: | Advanced Materials Interfaces |
|---|---|
| Main Authors: | , , , , , , |
| Format: | Article |
| Language: | English |
| Published: |
Wiley-VCH
2020-11-01
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| Subjects: | |
| Online Access: | https://doi.org/10.1002/admi.202000589 |