Facile Fabrication of Ultrafine Hollow Silica and Magnetic Hollow Silica Nanoparticles by a Dual-Templating Approach

<p>Abstract</p> <p>The development of synthetic process for hollow silica materials is an issue of considerable topical interest. While a number of chemical routes are available and are extensively used, the diameter of hollow silica often large than 50 nm. Here, we report on a fac...

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書誌詳細
出版年:Nanoscale Research Letters
主要な著者: Xiao Xiangheng, Zhang Shaofeng, Peng Tangchao, Ren Feng, Fan Lixia, Wu Wei, Jiang Changzhong
フォーマット: 論文
言語:英語
出版事項: SpringerOpen 2009-01-01
主題:
オンライン・アクセス:http://dx.doi.org/10.1007/s11671-009-9452-1