Edge beads removal in a photolithography process through a polymer mold

In this paper, a new approach for achieving a higher uniformity while spinning photoresist is presented. The proposed method allows to overcome the well-known problem of the edge beads formation, which shows either with circular, small or irregular samples. The method consists in the fabrication o...

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Bibliographic Details
Published in:Songklanakarin Journal of Science and Technology (SJST)
Main Authors: Stefania Torino, Shomnath Bhowmick, Mario Iodice, Maurizio Casalino, Vitaliano Tufano, Danilo Selvaggi, Giuseppe Coppola, Mariano Gioffrè
Format: Article
Language:English
Published: Prince of Songkla University 2021-04-01
Subjects:
photolithography
soft lithography
edge bead remover
photoresist
Online Access:https://rdo.psu.ac.th/sjstweb/journal/43-2/24.pdf

Internet

https://rdo.psu.ac.th/sjstweb/journal/43-2/24.pdf

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