Research on the application of thermal field emission gun in electron beam lithography
The classification and characteristics of electron gun are introduced, with emphasis on the principle, structure and characteristics of thermal field emission gun and its application in electron beam lithography machine. The relationship between the beam current of the electron beam lithography mach...
| Published in: | Dianzi Jishu Yingyong |
|---|---|
| Main Authors: | , , , , , , |
| Format: | Article |
| Language: | Chinese |
| Published: |
National Computer System Engineering Research Institute of China
2022-04-01
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| Subjects: | |
| Online Access: | http://www.chinaaet.com/article/3000148317 |
