Ordered Arrays of SiGe Islands from Low-Energy PECVD

<p>Abstract</p> <p>SiGe islands have been proposed for applications in the fields of microelectronics, optoelectronics and thermoelectrics. Although most of the works in literature are based on MBE, one of the possible advantages of low-energy plasma-enhanced chemical vapor deposit...

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Bibliographic Details
Published in:Nanoscale Research Letters
Main Authors: Chrastina D, Sordan R, Montuori V, Tagliaferri A, Vanacore G, Bonera E, Picco A, Bollani M, Fedorov A
Format: Article
Language:English
Published: SpringerOpen 2010-01-01
Subjects:
Pre-patterned Si substrate
Low-energy plasma-enhanced chemical vapor deposition growth
SiGe islands
e-Beam lithography
&#956;-Raman
Online Access:http://dx.doi.org/10.1007/s11671-010-9773-0

Internet

http://dx.doi.org/10.1007/s11671-010-9773-0

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