APA (7th ed.) Citation

Han, F., Lu, Z., Fu, L., Du, L., & Shi, X. (2025, March). Ultra-small Hysteresis IGZO Thin-Film Transistors with Room-Temperature Sputtered SiO2 as Dielectric Layer. Journal of Applied Science and Engineering.

Chicago Style (17th ed.) Citation

Han, Fangfei, Zheng Lu, Luan Fu, Lulu Du, and Xiaohui Shi. "Ultra-small Hysteresis IGZO Thin-Film Transistors with Room-Temperature Sputtered SiO2 as Dielectric Layer." Journal of Applied Science and Engineering Mar. 2025.

MLA (9th ed.) Citation

Han, Fangfei, et al. "Ultra-small Hysteresis IGZO Thin-Film Transistors with Room-Temperature Sputtered SiO2 as Dielectric Layer." Journal of Applied Science and Engineering, Mar. 2025.