Plasma-Enhanced Atomic Layer Deposition of TiN Thin Films as an Effective Se Diffusion Barrier for CIGS Solar Cells

Plasma-enhanced atomic layer deposition (PEALD) of TiN thin films were investigated as an effective Se diffusion barrier layer for Cu (In, Ga) Se₂ (CIGS) solar cells. Before the deposition of TiN thin film on CIGS solar cells, a saturated growth rate of 0.67 Å/cycle was confir...

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出版年:	Nanomaterials
主要な著者:	Hyun-Jae Woo, Woo-Jae Lee, Eun-Kyong Koh, Seung Il Jang, Shinho Kim, Hyoungseok Moon, Se-Hun Kwon
フォーマット:	論文
言語:	英語
出版事項:	MDPI AG 2021-02-01
主題:	CIGS solar cells plasma-enhanced atomic layer deposition TiN Se diffusion barrier
オンライン･アクセス:	https://www.mdpi.com/2079-4991/11/2/370