Antireflection Structures for VIS and NIR on Arbitrarily Shaped Fused Silica Substrates with Colloidal Polystyrene Nanosphere Lithography

Antireflective (AR) nanostructures offer an effective, broadband alternative to conventional AR coatings that could be used even under extreme conditions. In this publication, a possible fabrication process based on colloidal polystyrene (PS) nanosphere lithography for the fabrication of such AR str...

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Bibliographic Details

Published in:	Micromachines
Main Authors:	David Schmelz, Guobin Jia, Thomas Käsebier, Jonathan Plentz, Uwe Detlef Zeitner
Format:	Article
Language:	English
Published:	MDPI AG 2023-06-01
Subjects:	antireflection moth-eye nanostructures colloidal lithography polystyrene nanospheres Langmuir-Blodgett reactive ion etching
Online Access:	https://www.mdpi.com/2072-666X/14/6/1204