Fabrication method of GaN template for high-speed chemical lift-off
In this study, a gallium nitride (GaN) template fabrication method for efficient chemical lift-off (CLO) is developed. CLO is slower than other lift-off methods. An air tunnel structure is formed using a photoresist to reduce the process time and improve the etchant penetration rate. Furthermore, an...
| Published in: | AIP Advances |
|---|---|
| Main Authors: | , , , , , , , , |
| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2023-03-01
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| Online Access: | http://dx.doi.org/10.1063/5.0138850 |