APA (7th ed.) Citation

Goto, T., Sato, K., Yabuta, Y., Sugawa, S., & Hara, S. (2018, January). New Compact Electron Cyclotron Resonance Plasma Source for Silicon Nitride Film Formation in Minimal Fab System. IEEE Journal of the Electron Devices Society.

Chicago Style (17th ed.) Citation

Goto, Tetsuya, Kei-Ichiro Sato, Yuki Yabuta, Shigetoshi Sugawa, and Shiro Hara. "New Compact Electron Cyclotron Resonance Plasma Source for Silicon Nitride Film Formation in Minimal Fab System." IEEE Journal of the Electron Devices Society Jan. 2018.

MLA (9th ed.) Citation

Goto, Tetsuya, et al. "New Compact Electron Cyclotron Resonance Plasma Source for Silicon Nitride Film Formation in Minimal Fab System." IEEE Journal of the Electron Devices Society, Jan. 2018.