Reactive Dual Magnetron Sputtering: A Fast Method for Preparing Stoichiometric Microcrystalline ZnWO₄ Thin Films

Thin films of ZnWO₄, a promising photocatalytic and scintillator material, were deposited for the first time using a reactive dual magnetron sputtering procedure. A ZnO target was operated using an RF signal, and a W target was operated using a DC signal. The power on the ZnO...

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Bibliographic Details

Published in:	Surfaces
Main Authors:	Yannick Hermans, Faraz Mehmood, Kerstin Lakus-Wollny, Jan P. Hofmann, Thomas Mayer, Wolfram Jaegermann
Format:	Article
Language:	English
Published:	MDPI AG 2021-04-01
Subjects:	ZnWO<sub>4</sub> dual magnetron sputtering thin-film deposition photoelectron spectroscopy
Online Access:	https://www.mdpi.com/2571-9637/4/2/13