High‐Conductivity Stoichiometric Titanium Nitride for Bioelectronics

Abstract Bioelectronic devices such as neural stimulation and recording devices require stable low‐impedance electrode interfaces. Various forms of nitridated titanium are used in biointerface applications due to robustness and biological inertness. In this work, stoichiometric TiN thin films are fa...

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Bibliographic Details

Published in:	Advanced Electronic Materials
Main Authors:	Imrich Gablech, Ludovico Migliaccio, Jan Brodský, Marek Havlíček, Pavel Podešva, Radim Hrdý, Jiří Ehlich, Maciej Gryszel, Eric Daniel Głowacki
Format:	Article
Language:	English
Published:	Wiley-VCH 2023-04-01
Subjects:	bioelectronics ion‐beam sputtering multielectrode arrays titanium nitride
Online Access:	https://doi.org/10.1002/aelm.202200980