Islam, M. S., Ni, L., & Boer, M. P. d. (2025, September). Anisotropic reactive ion etching of 2.5 micrometer thick alpha phase tantalum films for surface micromachining. Micro and Nano Engineering.
Chicago Style (17th ed.) CitationIslam, Md Shariful, Longchang Ni, and Maarten P. de Boer. "Anisotropic Reactive Ion Etching of 2.5 micrometer Thick Alpha Phase Tantalum Films for Surface Micromachining." Micro and Nano Engineering Sep. 2025.
MLA (9th ed.) CitationIslam, Md Shariful, et al. "Anisotropic Reactive Ion Etching of 2.5 micrometer Thick Alpha Phase Tantalum Films for Surface Micromachining." Micro and Nano Engineering, Sep. 2025.
Warning: These citations may not always be 100% accurate.