Islam, M. S., Ni, L., & Boer, M. P. d. (2025, September). Anisotropic reactive ion etching of 2.5 micrometer thick alpha phase tantalum films for surface micromachining. Micro and Nano Engineering.
Chicagoスタイル(17版)引用形式Islam, Md Shariful, Longchang Ni, , Maarten P. de Boer. "Anisotropic Reactive Ion Etching of 2.5 micrometer Thick Alpha Phase Tantalum Films for Surface Micromachining." Micro and Nano Engineering Sep. 2025.
MLA(9版)引用形式Islam, Md Shariful, et al. "Anisotropic Reactive Ion Etching of 2.5 micrometer Thick Alpha Phase Tantalum Films for Surface Micromachining." Micro and Nano Engineering, Sep. 2025.
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