Silicon selective etching by gold implantation: Feasibility and nanofabrication capabilities

Silicon nanofabrication plays a crucial role in the development of advanced electronic, photonic, and quantum devices. Focused ion beam (FIB) milling is widely used for direct patterning at the nanoscale, but it requires high ion fluences, leading to long processing times, material redeposition, and...

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Bibliographic Details

Published in:	Micro and Nano Engineering
Main Authors:	E. Scattolo, A. Cian, J. Llobet, X. Borrise Nogue, S. Mondal, M. Barozzi, A. Bagolini, M. Crivellari, F. Pérez-Murano, D. Giubertoni
Format:	Article
Language:	English
Published:	Elsevier 2025-09-01
Subjects:	Nanofabrication Maskless Silicon nanowires
Online Access:	http://www.sciencedirect.com/science/article/pii/S2590007225000140