Structural,Morphology and PL Properties of ZnO Film Deposition on Porous Silicon
ZnO thin film was deposited on glass and porous silicon by spray pyrolysis technology with fixed parameters consist (substrate temperature 400Co, deposition rate 100nm/min), and the measurements of structural (XRD), morphology (AFM) and photoluminesces (PL) refer to good growth of ZnO after using po...
| الحاوية / القاعدة: | Engineering and Technology Journal |
|---|---|
| المؤلفون الرئيسيون: | , |
| التنسيق: | مقال |
| اللغة: | الإنجليزية |
| منشور في: |
Unviversity of Technology- Iraq
2014-06-01
|
| الموضوعات: | |
| الوصول للمادة أونلاين: | https://etj.uotechnology.edu.iq/article_105264_387bf7ee062740fec5e29e22c3b296f9.pdf |