Structural,Morphology and PL Properties of ZnO Film Deposition on Porous Silicon

ZnO thin film was deposited on glass and porous silicon by spray pyrolysis technology with fixed parameters consist (substrate temperature 400Co, deposition rate 100nm/min), and the measurements of structural (XRD), morphology (AFM) and photoluminesces (PL) refer to good growth of ZnO after using po...

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Bibliographic Details
Published in:Engineering and Technology Journal
Main Authors: Uday Muhsin Nayef, Mohammed Waleed Muayad
Format: Article
Language:English
Published: Unviversity of Technology- Iraq 2014-06-01
Subjects:
porous silicon
zno films
xrd
afm
Online Access:https://etj.uotechnology.edu.iq/article_105264_387bf7ee062740fec5e29e22c3b296f9.pdf
Description
Summary:ZnO thin film was deposited on glass and porous silicon by spray pyrolysis technology with fixed parameters consist (substrate temperature 400Co, deposition rate 100nm/min), and the measurements of structural (XRD), morphology (AFM) and photoluminesces (PL) refer to good growth of ZnO after using porous silicon more than using glass and that's come from sponge like structure of porous silicon and large spastic area of porous silicon (about 500m2/cm3).
ISSN:1681-6900
2412-0758

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