Structural,Morphology and PL Properties of ZnO Film Deposition on Porous Silicon

ZnO thin film was deposited on glass and porous silicon by spray pyrolysis technology with fixed parameters consist (substrate temperature 400Co, deposition rate 100nm/min), and the measurements of structural (XRD), morphology (AFM) and photoluminesces (PL) refer to good growth of ZnO after using po...

وصف كامل

التفاصيل البيبلوغرافية
الحاوية / القاعدة:	Engineering and Technology Journal
المؤلفون الرئيسيون:	Uday Muhsin Nayef, Mohammed Waleed Muayad
التنسيق:	مقال
اللغة:	الإنجليزية
منشور في:	Unviversity of Technology- Iraq 2014-06-01
الموضوعات:	porous silicon zno films xrd afm
الوصول للمادة أونلاين:	https://etj.uotechnology.edu.iq/article_105264_387bf7ee062740fec5e29e22c3b296f9.pdf

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