Design and fabrication of wafer-scale highly uniform silicon nanowire arrays by metal-assisted chemical etching for antireflection films

We present a novel and facile scheme for fabricating wafer-scale arrays of highly uniform vertically aligned silicon nanowires (Si-NWs) in the diameter range of 50 to 200 nm. The key idea is to fabricate thin gold (Au) nanostructures using magnetron sputtering followed by de-wetting of Au and subseq...

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Bibliographic Details

Published in:	Results in Physics
Main Authors:	Chuhao Yao, Yue Zhao, Xiaomeng Zhang, Hailiang Li, Changqing Xie
Format:	Article
Language:	English
Published:	Elsevier 2021-12-01
Subjects:	Silicon nanowires Maskless method Exciton generation rate Metal-assisted chemical etching Antireflection film
Online Access:	http://www.sciencedirect.com/science/article/pii/S2211379721010160