APA (7th ed.) Citation

Wu, E. Y., Ando, T., & Jamison, P. (2023, October). Reversing A Decades‐Long Scaling Law of Dielectric Breakdown using Hydrogen‐Plasma‐Treated HfO2 ReRAM Devices. Advanced Electronic Materials.

Chicago Style (17th ed.) Citation

Wu, Ernest Y., Takashi Ando, and Paul Jamison. "Reversing A Decades‐Long Scaling Law of Dielectric Breakdown Using Hydrogen‐Plasma‐Treated HfO2 ReRAM Devices." Advanced Electronic Materials Oct. 2023.

MLA (9th ed.) Citation

Wu, Ernest Y., et al. "Reversing A Decades‐Long Scaling Law of Dielectric Breakdown Using Hydrogen‐Plasma‐Treated HfO2 ReRAM Devices." Advanced Electronic Materials, Oct. 2023.